Interesting opportunity to publish at SPIE journal from MOEMS-MEMS Symposium at SPIE Photonics West to the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3).
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Journal of Micro/Nanolithography, MEMS, and MOEMS
The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) (formerly the Journal of Microlithography, Microfabrication, and Microsystems, 2002–2006) publishes peer-reviewed papers on the development of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, micro-optoelectromechanical systems, and photonics industries.Scope
Editorial Board
Information for Authors
Information for Reviewers
Editorial Schedule Journal Staff
Subscriptions
Advertising
JM3 would like to thank the reviewers who contributed to the success of our publication in 2010. Click to view the list of 2010 JM3 reviewers.
See details below
Journal of Micro/Nanolithography, MEMS, and MOEMS
The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) (formerly the Journal of Microlithography, Microfabrication, and Microsystems, 2002–2006) publishes peer-reviewed papers on the development of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, micro-optoelectromechanical systems, and photonics industries.Scope
Editorial Board
Information for Authors
Information for Reviewers
Editorial Schedule Journal Staff
Subscriptions
Advertising
JM3 would like to thank the reviewers who contributed to the success of our publication in 2010. Click to view the list of 2010 JM3 reviewers.
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Editor-in-Chief
Burn J. Lin
tel: +011 886 3 563 6688 ext 712-5858
burnlin@tsmc.com
Managing Editor
Karolyn S. Labes
tel: +1 360 676 3290
journals@spie.org